发明名称 Nanoscale metal oxide resistive switching element
摘要 A non-volatile memory device structure. The non-volatile memory device structure comprises a first electrode formed from a first metal material, a resistive switching element overlying the first electrode. The resistive switching element comprises a metal oxide material characterized by one or more oxygen deficient sites. The device includes a second electrode overlying the resistive switching layer, the second electrode being formed from a second metal material. The second electrode is made from a noble metal. The one or more oxygen deficient sites are caused to migrate from one of the first electrode or the second electrode towards the other electrode upon a voltage applied to the first electrode or the second electrode. The device can have a continuous change in resistance upon applying a continuous voltage ramp, suitable for an analog device. Alternatively, the device can have a sharp change in resistance upon applying the continuous voltage ramp, suitable for a digital device.
申请公布号 US9508425(B2) 申请公布日期 2016.11.29
申请号 US201113167920 申请日期 2011.06.24
申请人 THE REGENTS OF THE UNIVERSITY OF MICHIGAN 发明人 Lu Wei;Jo Sung Hyun
分类号 H01L47/00;G11C11/56;G11C13/00;H01L27/24;H01L45/00 主分类号 H01L47/00
代理机构 Amin, Turocy & Watson, LLP 代理人 Amin, Turocy & Watson, LLP
主权项 1. A switching device, comprising: a first electrode, the first electrode including a first metal material; a resistive switching element overlying the first electrode, the resistive switching element comprising a metal oxide material characterized by a plurality of oxygen deficient sites; and a second electrode overlying the resistive switching element, the second electrode including a second metal material, wherein the first metal material and the second metal material do not appreciably react with the resistive switching element; wherein the plurality of oxygen deficient sites are caused to migrate within the resistive switching element towards the first electrode or the second electrode upon a positive voltage applied to the second electrode or the first electrode, respectively, wherein migration of the plurality of oxygen deficient sites is characterized by a continuous change of conductance of the resistive switching element with a continuous change in magnitude of the positive voltage applied, and wherein the continuous change of conductance of the resistive switching element provides for an analog memory device.
地址 Ann Arbor MI US