发明名称 |
POWER SUPPLY SYSTEM, PLASMA PROCESSING APPARATUS AND POWER SUPPLY CONTROL METHOD |
摘要 |
A power supply system includes a high frequency power supply which supplies a high frequency power; a DC power supply which supplies a first negative DC voltage or a second negative DC voltage having an absolute value larger than that of the first DC voltage; and a control unit which performs a power supply control process of repeating a supply and a stop of the supply of the high frequency power alternately; stopping supplies of the first and second DC voltages for a first period, which is a time period from a beginning of the supply of the high frequency power within a period during which the high frequency power is being supplied; supplying the first DC voltage for a second period except the first period within the period; and supplying the second DC voltage for a period during which the supply of the high frequency power is stopped. |
申请公布号 |
US2016284514(A1) |
申请公布日期 |
2016.09.29 |
申请号 |
US201615075505 |
申请日期 |
2016.03.21 |
申请人 |
Tokyo Electron Limited |
发明人 |
Hirano Taichi;Ishibashi Junji;Ito Keiki;Sato Kunihiro |
分类号 |
H01J37/32 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
1. A power supply system, comprising:
a first high frequency power supply configured to supply a high frequency power for plasma generation to a lower electrode configured to mount a processing target object thereon; a DC power supply configured to supply a first negative DC voltage or a second negative DC voltage having an absolute value larger than that of the first DC voltage to an upper electrode provided to face the lower electrode; and a control unit configured to perform a power supply control process of repeating a supply of the high frequency power and a stop of the supply of the high frequency power alternately; stopping a supply of the first DC voltage and a supply of the second DC voltage for a first period, which is a time period from a beginning of the supply of the high frequency power within a period during which the high frequency power is being supplied; supplying the first DC voltage for a second period except the first period within the period during which the high frequency power is being supplied; and supplying the second DC voltage for a period during which the supply of the high frequency power is stopped. |
地址 |
Tokyo JP |