Cooling of target material in sputtering process - mounting target on plate with formed channel through which cooling fluid is circulated

摘要

The manufacture of target elements for use in vapour deposition processes has the target (12) mounted on a baseplate (11) with built in cooling. The target is produced from a powder mix of titanium and aluminium. The baseplate has a channel (13) formed with a zigzag profile. A cooling fluid, e.g. water, can be circulated through the channel to provide warming or cooling to generate a uniform sputter geometry for the target. ADVANTAGE - Optimised cooling. Increased sputter power.