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发明名称
Triangular Deposition Chamber for a Vapor Deposition System
摘要
申请公布号
CA2120092(A1)
申请公布日期
1994.12.09
申请号
CA19942120092
申请日期
1994.03.28
申请人
CVD INCORPORATED
发明人
GOELA, JITENDRA S.;BURNS, LEE E.;TEVEROVSKY, ALEXANDER;MACDONALD, JAMES C.
分类号
C23C16/32;C23C16/01;C23C16/44;C23C16/455;C30B28/14;C30B29/36;(IPC1-7):C23C16/00
主分类号
C23C16/32
代理机构
代理人
主权项
地址
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