SUBSTRATE HEAT TREATMENT DEVICE

摘要

PROBLEM TO BE SOLVED: To allow an even process with a simple device configuration. SOLUTION: Provided at about the same level as a substrate W, a photo- absorptive plate-like member 40 almost entirely covers the internal horizontal cross-section of a chamber 10 except for a release-hole 40a at the substrate position. The plate-like member 40 is heated together with the substrate W for heat radiation. The heat radiation heats a dinitrogen monoxide gas on upper-stream side US of a gas stream GS to promote its decomposition, resulting in an equilibrium state when passing the substrate W. The plate-like member 40 also provides a rectification function for the gas stream GS as well, for even substrate treatment.