发明名称 APPARATUS FOR COATING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To make savable the space while a paint film of high quality is formed on a substrate of a large area by holding the substrate in a vertical state by a holding member of a substrate conveying part in feed of the substrate to a substrate placing member of an coating part, and conveyance of the substrate to a drying part from the coating part after coating. SOLUTION: A substrate S is fed to a placing surface 19 of a substrate placing member 17 being at an almost vertical position by being held in a vertical state by a holding member 34 of a substrate conveyance part 31. The substrate placing member 17 transfers the placing surface 19 from an almost vertical position to a specific applicating position (for example, pivot the placed surface 19 so as to make a specific angle of 0-45 deg. to horizontality), and coating of the substrate S is executed by a coating means 12. The substrate S after coating is conveyed from the placing surface 19 of the substrate placing member 17 existing at an almost vertical position to a vacuum chamber 22 of a drying part 21 by being held in a vertical state by the holding member 34 of the substrate conveyance part 31. Thereby, deflextion of the substrate S owing to empty weight can be prevented, and even the substrate S of a large area can be stably conveyed.
申请公布号 JP2000237672(A) 申请公布日期 2000.09.05
申请号 JP19990042819 申请日期 1999.02.22
申请人 DAINIPPON PRINTING CO LTD 发明人 MATSUO SOICHI;SUZUKI YASUAKI;AMADA AKIRA;KANAZAWA MASAHARU
分类号 H05K3/28;B05B13/02;B05C13/02;B05C15/00;(IPC1-7):B05C13/02 主分类号 H05K3/28
代理机构 代理人
主权项
地址