| 摘要 |
PROBLEM TO BE SOLVED: To reduce glitch noise of a D/A converter by performing lithography lithography again by setting lithographic position data of shape electron beam lithography and follow-up data again, when a sample stand movement amount during lithography on a sample stand which moves continuously tends to deviate from a preset allowable range. SOLUTION: An allowable range of movement amount in lithography is preset in a comparison means 10 for movement amount in lithography. When movement amount of a sample stand 19 exceeds an allowable range, deviation alarm is emitted to a sub-deflection control circuit 7 by the comparison means 10, and an interruption signal is emitted to a blanking control circuit 11 which controls irradiation time of electron beam for lithography simultaneously. The blanking control circuit 11 immediately interrupts present lithography. The sub-deflection control circuit 7 modifies position data of lithography. A lithographic position is moved to an allowable range by movement of lithographic position data in this way. Then, pattern generation by the blanking control circuit 11 is started again.
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