发明名称 SUBSTRATE-HOLDING TOOL AND SINGLE CRYSTAL EPITAXIAL FILM- PRODUCING DEVICE EQUIPPED WITH THE SAME TOOL
摘要 PROBLEM TO BE SOLVED: To simply and surely hold a substrate and prevent occurrence of crack by engaging the corner parts of a square plate type single crystal substrate with holes of plural substrate holding parts attached to supporting rods. SOLUTION: Substrate holding parts 15c comprising four flat plates are attached through a radial and circular joining part to a supporting rod 15a and through holes 15d are each bored and provided in the lower parts. These substrate holding parts 15c may be formed of wire materials having holes formed in ring shapes or by joining flat plates in which holes are bored to wire materials. The corner parts of a square plate type single crystal substrate 16 are retained by engagement with through holes 15d of these flat plates. The single crystal substrate 16 attached to the substrate holding tools is immersed into a melt composition obtained by melting flux with a composition to be deposited and cooled to make the material to be deposited in supersaturated state. Then, the material to be deposited is deposited on the substrate. Thereby, a single crystal film is formed in high yield while preventing occurrence of crack of the single crystal substrate 16 originated from the difference of coefficients of thermal expansion.
申请公布号 JP2000351691(A) 申请公布日期 2000.12.19
申请号 JP19990160101 申请日期 1999.06.07
申请人 MURATA MFG CO LTD 发明人 SHIMOKATA MIKIO
分类号 H01L21/208;C30B19/06;(IPC1-7):C30B19/06;//H01L21/2 主分类号 H01L21/208
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