| 摘要 |
PROBLEM TO BE SOLVED: To provide a dry etching device capable of automatically loading/ unloading a mask. SOLUTION: In the dry etching device including a vacuum chamber 10 which is applied with DC bias for etching with a plasma, a high-frequency generator 31 to be mounted at the lower part of the chamber 10, a reactant gas feeding part for feeding reactant gas for the plasma into the chamber 10, an exhaustion part 33 for exhausting a by-product made by etching operation from the chamber 10 and a robot for transporting a mask M to a gate 32 provided at the chamber 10, the chamber 10 consists of a lid 20 provided with an upper electrode 21 and a grounded container 30, which are connected and separated with/from each other and the part 20 is provided with a loading means 22 for loading the mask M.
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