发明名称 Method and apparatus for verifying mask pattern data according to given rules
摘要 Pattern data of a designed circuit, including a plurality of feature data is verified according to given rules (S2). If feature data not meeting the rules exists, contents of the feature data are outputted as an error (S3), and if a designer considers the error is not problematic (false error) in view of characteristics of the circuit (S5), he inputs the error information indicating the error is false to add it to a file including the pattern data (S8). The file is read to perform processing on feature data to obtain exposure data for manufacturing a mask, and the feature data processed is verified according to given rules. If any feature data not meeting the rule exists, it is judged whether the contents of the feature data are included in the error information. If it is judged to be included, further judged whether the error is false. If false, the process is continued to repeat for the rest data.
申请公布号 US2002019968(A1) 申请公布日期 2002.02.14
申请号 US20010778075 申请日期 2001.02.07
申请人 OHTA KAZUTOSHI;HORIE TSUTOMU 发明人 OHTA KAZUTOSHI;HORIE TSUTOMU
分类号 G03F1/08;G03F1/00;G03F1/68;G03F1/70;G03F7/20;G06F17/50;H01L21/82;(IPC1-7):G06F17/50 主分类号 G03F1/08
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