发明名称 Depositing method and a surface modifying method for nano-particles in a gas stream
摘要 A method of depositing nano-particles in a gas stream for efficiently depositing nano-particles by irradiating an electron beam on charged nano-particles in the stream of a first gas species containing the nano-particles, as well as a method of modifying the surface of the nano-particles in a gas stream by mixing them with the first gas species in a gas mixing chamber thereby activating the second gas species, intended for providing a method of depositing nano-particles and a method of modifying the surface thereof in a gas stream, capable of efficiently depositing the nano-particles in a charged state in a gas stream and modifying the surface of the nano-particles which are extremely sensitive to defects and impurities caused by large exposure ratio of surface atoms in a gas stream at a good controllability.
申请公布号 US2003003241(A1) 申请公布日期 2003.01.02
申请号 US20020180054 申请日期 2002.06.27
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 SUZUKI NOBUYASU;MAKINO TOSHIHARU;YAMADA YUKA;YOSHIDA TAKEHITO
分类号 B82B3/00;B05D1/12;B05D3/06;C23C4/12;C23C14/58;H01L21/203;(IPC1-7):B05D1/04;B05D1/06 主分类号 B82B3/00
代理机构 代理人
主权项
地址