| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum processor that makes it possible to level the flow and the pressure of the exhaust gas from a vacuum processing chamber and to vacuum process a substrate with higher uniformity. SOLUTION: The vacuum processor comprises the vacuum processing chamber 1, a mounting platform 2, an exhaust vent 4 arranged at the lower portion of the vacuum processing chamber decentering from its center, an exhaust mechanism 6 which discharges the processing space 20 connected to the exhaust vent 4 and formed at the upper part of the mounting platform 2 in the vacuum processing chamber 1 through an exhaust line 21 which is specified by the mounting platform 2 and the wall of the vacuum processing chamber 1, a plurality of pressure gauges 8, 9 arranged at circumferences in the vacuum processing chamber, and an aperture adjusting material 3 to adjust the aperture distribution of the exhaust line 21 so that the measured values of a plurality of the pressure gauges 8, 9 are almost the same.
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