| 摘要 |
PURPOSE:To ensure excellent characteristics such as sensitivity, resolution, depth of a focus and heat resistance and to control standing wave effect by blending alkali-soluble novolac resin with a specified ester compd. and a phenolic compd. represented by a specified formula. CONSTITUTION:This positive type photoresist compsn. contains alkali-soluble novola resin, an ester compd. of naphthoquinone-1,2-diazido-sulfonic acid and a phenolic compd. represented by formula I or II. In the formula I, R<1> is 1-12C alkyl or 7-10C aralkyl. In the formula II, R<2> is 1-5C alkyl, (n) is an integer of 1-5, and in the case of n$2, plural R<2>'s may be different from each other. The ester compd. of naphthoquinone-1,2-diazidosulfonic acid is, e.g. an ester compd. of naphthoquinone-1,2-diazido-5-sulfonic acid or naphthoquinone-1,2- diazido-4-sulfonic acid. |
