| 摘要 |
PROBLEM TO BE SOLVED: To provide a washing apparatus without a contaminated residue with a trace constituent, and also to provide a washing method. SOLUTION: The washing apparatus and the washing method are composed of: an analysis means 12 for analyzing a gas sample 11 to be measured, introduced through a sample introducing pipe 10; a washing-liquid feeding means 14 for feeding a washing liquid 13 for solvent-washing from the analysis means 12 of the above sample introducing pipe 10 toward its inner part; an ultraviolet spectrophotometer 16 for measuring a residual sample concentration in a wash-waste liquid 15 after washing; a regenerating means 17 for regenerating the wash-waste liquid 15; and a washing-gas feeding means 19 for feeding a washing gas 18 for gas-washing from the analysis means 12 of the above sample introducing pipe 10 toward its inner part after solvent-washing said above. COPYRIGHT: (C)2004,JPO |
