发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To suppress the frequency for replacing the filter by elongating the life, by eliminating clogging in filters. <P>SOLUTION: An endless filter 20 is rotated so as to repeatedly pass through a slurry filtering part 30 and a back-cleaning part 40, which are arranged to face a filter surface 20a. If clogging is caused by the filtration of slurry, the filter surface 20a is transferred to the back-cleaning part 40 to regenerate filtering functions. The reproduced filter surface 20a is then transferred to the slurry filtering part 30, to repeat filtration. Thus, by repeatedly performing filtration and reproduction with a single filter, the frequency of changing the filter is suppressed. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2004063846(A) 申请公布日期 2004.02.26
申请号 JP20020220924 申请日期 2002.07.30
申请人 RENESAS TECHNOLOGY CORP 发明人 ONO DAISUKE;FUKADA HIROSHI;MITSUI KATSUHIRO
分类号 B24B57/02;B24B37/00;H01L21/304;(IPC1-7):H01L21/304 主分类号 B24B57/02
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