EXPOSURE MACHINE AND EXPOSURE METHOD

摘要

PROBLEM TO BE SOLVED: To provide an exposure machine which suppresses misalignment of an exposure pattern in each substrate to the minimum caused when a substrate having a plurality of photosensitive materials is exposed by a sheet feed method, and which can improve the yield of products. SOLUTION: A thermocouple 18 is attached to a mask stage 15 and is connected to a controlling apparatus 29. The controlling apparatus 29 controls the exposure stage 12 and an irradiation optical system 20 of the exposure machine 10 in such a manner that the mask 16 is heated as pretreatment to exposure by exposure light exiting from the irradiation optical system 20 and that when the temperature of the mask 16 detected by the thermocouple 18 reaches a specified set temperature, exposure of the substrate 31 with photosensitive materials is started. COPYRIGHT: (C)2005,JPO&NCIPI