发明名称 |
Post-exposure treatment method of silver halide emulsion layer, hologram manufactured using the method, and holographic optical element including the hologram |
摘要 |
A post-exposure treatment method of a silver halide emulsion layer in the manufacture of a hologram, a hologram manufacturing using the post-exposure treatment method, and a holographic optical element including the hologram are provided. The post-exposure treatment method of a silver halide emulsion layer involves: pre-hardening the silver halide emulsion layer after exposure; developing the pre-hardened silver halide emulsion layer using a developer solution; bleaching the developed silver halide emulsion layer; hardening the bleached silver halide emulsion layer; drying the hardened silver halide emulsion layer; surface-hardening the dried silver halide emulsion layer; fixing the hardened silver halide emulsion layer; treating the fixed silver halide emulsion layer using warm water; and drying the silver halide emulsion layer which has been treated using warm water.
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申请公布号 |
US6811930(B2) |
申请公布日期 |
2004.11.02 |
申请号 |
US20020154802 |
申请日期 |
2002.05.28 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM JONG-MAN |
分类号 |
G03C5/08;G02B5/32;G03C1/00;G03C5/26;G03C5/29;G03C5/38;G03C5/44;G03C11/00;G03C11/08;G03C11/16;G03H1/00;G03H1/02;G03H1/04;G03H1/18;G03H5/00;(IPC1-7):G03C5/29 |
主分类号 |
G03C5/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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