发明名称 |
METHOD OF PRODUCING THIN FILM OR POWDER ARRAY USING LIQUID SOURCE MISTED CHEMICAL DEPOSITION PROCESS USING REACTION AND DIFFUSION BETWEEN LIQUID AND LIQUID |
摘要 |
PURPOSE: A method of producing a thin film or a powder array using a liquid source misted chemical deposition process is provided to form the thin film or the power array having an uniform phase by using a liquid mixing method at the room temperature. CONSTITUTION: Two or more metal precursor solutions are fabricated by resolving a metal precursor into a solvent. A liquid source is generated by applying a high frequency to the solution selected from the metal precursor solutions within a reactor. The liquid source is transferred to a vacuum chamber under the constant pressure. The liquid source is deposited on each region of a substrate by using a folding screen or a shifting mask. A thin film or a powder array is fabricated by performing a thermal process. The fabrication processes are performed by using the remaining solution. |
申请公布号 |
KR20050022725(A) |
申请公布日期 |
2005.03.08 |
申请号 |
KR20030060391 |
申请日期 |
2003.08.29 |
申请人 |
KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY |
发明人 |
KIM, KI WOONG;WOO, SEONG IHL |
分类号 |
B01J29/76;B01J19/00;B01J19/10;B05D1/02;B05D7/24;C23C16/00;C23C16/44;C23C18/06;C23C18/08;C23C18/12;H01L21/20;H01L21/316;H01M4/139;H01M4/88;H01M4/92;H01M10/05 |
主分类号 |
B01J29/76 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|