发明名称 METHOD OF PRODUCING THIN FILM OR POWDER ARRAY USING LIQUID SOURCE MISTED CHEMICAL DEPOSITION PROCESS USING REACTION AND DIFFUSION BETWEEN LIQUID AND LIQUID
摘要 PURPOSE: A method of producing a thin film or a powder array using a liquid source misted chemical deposition process is provided to form the thin film or the power array having an uniform phase by using a liquid mixing method at the room temperature. CONSTITUTION: Two or more metal precursor solutions are fabricated by resolving a metal precursor into a solvent. A liquid source is generated by applying a high frequency to the solution selected from the metal precursor solutions within a reactor. The liquid source is transferred to a vacuum chamber under the constant pressure. The liquid source is deposited on each region of a substrate by using a folding screen or a shifting mask. A thin film or a powder array is fabricated by performing a thermal process. The fabrication processes are performed by using the remaining solution.
申请公布号 KR20050022725(A) 申请公布日期 2005.03.08
申请号 KR20030060391 申请日期 2003.08.29
申请人 KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY 发明人 KIM, KI WOONG;WOO, SEONG IHL
分类号 B01J29/76;B01J19/00;B01J19/10;B05D1/02;B05D7/24;C23C16/00;C23C16/44;C23C18/06;C23C18/08;C23C18/12;H01L21/20;H01L21/316;H01M4/139;H01M4/88;H01M4/92;H01M10/05 主分类号 B01J29/76
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