发明名称 MASK FOR SOLIDIFICATION, METHOD FOR SOLIDIFY AND METHOD FOR MANUFACTURING A THIN FILM TRANSISTOR ARRAY PANEL INCLUDING THE METHOD
摘要 <p>A crystallization mask for laser illumination for converting amorphous silicon into polysilicon is provided, which includes: a plurality of transmissive areas having a plurality of first slits for adjusting energy of the laser illumination passing through the mask; and an opaque area.</p>
申请公布号 KR20050048318(A) 申请公布日期 2005.05.24
申请号 KR20030082222 申请日期 2003.11.19
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KANG, MYUNG KOO;KIM, HYUN JAE;LEE, SU GYEONG
分类号 G02F1/1362;B23K26/06;G02F1/13;H01L21/20;H01L21/268;H01L21/336;H01L29/786;H01L51/50;H05B33/10;(IPC1-7):G02F1/13 主分类号 G02F1/1362
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