SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a laser irradiation apparatus reducing the proportion of a region in which a microcrystal is formed occupying the entire region irradiated with laser beams and performing satisfactory laser irradiation to a semiconductor film, and provide a laser irradiation method. SOLUTION: By passing a laser beam 104 emitted from a laser oscillator 101 through a slit 102, a portion with weak intensity is intercepted. After that, the laser beam is deflected by a mirror 103. The laser beam is formed into a beam of an optional size by using convex-type cylindrical lenses 105 and 106 or convex type spherical lenses, and then an irradiated surface is irradiated with it. COPYRIGHT: (C)2006,JPO&NCIPI