DEVELOPING DEVICE, DEVELOPING METHOD, CHARGED PARTICLE BEAM PLOTTING DEVICE, AND CHARGED PARTICLE BEAM PLOTTING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a developing device and a developing method capable of executing highly accurate development by correcting dimensional errors in the line width of a pattern which are generated due to variation in atmospheric pressures. SOLUTION: The developing device is provided with an atmospheric pressure measuring part 101, and a control part 106 controls the projection pressure of a developing solution 105 projected from a nozzle 103 by a developing solution projection part 104 on the basis of correlation information between dimensional errors in the line width of a pattern which are generated under a plurality of atmospheric pressures and the measured atmospheric pressures. Consequently, highly accurate development can be achieved by correcting errors due to variation in atmospheric pressures. COPYRIGHT: (C)2008,JPO&INPIT