发明名称 POLARIZING PLATE PROTECTIVE FILM, POLARIZING PLATE, LIQUID CRYSTAL DISPLAY DEVICE, AND METHOD FOR PREPARING POLARIZING PLATE PROTECTIVE FILM
摘要 There is provided a polarizing plate protective film including: a hard coat layer with a thickness of 3 to 10 μm on at least one surface of a cellulose acylate film with a thickness of 15 to 40 μm, wherein the hard coat layer is a layer formed by curing a composition for forming a hard coat layer containing specific components, and the polarizing plate protective film has a WVTRA of 300 g/m2/day or less and a ratio WVTRA/WVTRB of 0.6 to 1.0, wherein WVTRA represents a water vapor transmission rate under environments of a temperature of 40° C. and a relative humidity of 90% and WVTRB represents a water vapor transmission rate under environments of a temperature of 40° C. and a relative humidity of 90% after being exposed to the environments of a temperature of 85° C. and a relative humidity of 85% for 24 hours.
申请公布号 US2016272843(A1) 申请公布日期 2016.09.22
申请号 US201615073165 申请日期 2016.03.17
申请人 FUJIFILM Corporation 发明人 SUZUKI Masaaki;TAKADA Katsuyuki;NAKAMURA Ryo;HAYASHI Hidenori;SASADA Yasuyuki
分类号 C09D135/02;G02B1/14;G02F1/1335;G02B5/30 主分类号 C09D135/02
代理机构 代理人
主权项 1. A polarizing plate protective film comprising: a hard coat layer having a film thickness of 3 μm to 10 μm on at least one surface of a cellulose acylate film having a thickness of 15 μm to 40 μm, wherein the hard coat layer is a layer formed by curing a composition for forming a hard coat layer containing: (a) a compound having at least one alicyclic epoxy group in molecule(b) a compound having three or more ethylenically unsaturated double bond groups in molecule(c) a radical polymerization initiator(d) a cationic polymerization initiator, and the polarizing plate protective film has a WVTRA of 300 g/m2/day or less and a ratio WVTRA/WVTRB of 0.6 to 1.0 when a water vapor transmission rate under environments of a temperature of 40° C. and a relative humidity of 90% is defined as WVTRA and a water vapor transmission rate under environments of a temperature of 40° C. and a relative humidity of 90% after being exposed to the environments of a temperature of 85° C. and a relative humidity of 85% for 24 hours is defined as WVTRB.
地址 Tokyo JP
您可能感兴趣的专利