| 摘要 |
PURPOSE:To amend the pin hole of a mask by simple operation by baking the mask to be amended and fixing the color tone of a material film in which the photochromic material film to cover the defect of the photomask in pin hole condition is colored. CONSTITUTION:The whole surface of the pattern of the mask to be amended is coated by the solvent of photochromic material of spiropilan system and a photochromic material film 8 is formed. Then a partial exposure is made to the part covering a defect 3 in pin hole condition of a film 8. And a colored part 9 is formed to the film 8. After that, the mask to be amended is baked and the color tone of the colored part 9 is more densely changed and the mask to be amended is immersed in fixing liquid to fix the color tone of the material film. As the result, the pin hole of the mask is amended by simple operation. Furthermore, the exposure defect of the transparent pattern part by sticking foreign material is not ocurred in case of amendment. |
