| 摘要 |
The invention concerns a method for the application of sample liquids to a gel type electrophoretic medium which leaves substantially no application artifact in the final electrophoretic pattern. The method consists of placing a cover sheet, having slits formed therein at the desired sample application locations, on the upper surface of the gel. An excess of sample is placed over each slit and allowed to remain in place for a fixed time period. It is then blotted to remove excess sample material and the cover is removed. Sample materials imbibed into the gel will then be appropriately located and in predetermined amounts depending on the gel porosity and time that the sample is in contact with the gel. |
