| 摘要 |
PURPOSE:To prevent deformation of an emulsion photomask due to water drops, by coating a surfactant on the surface of an emulsion photomask wetted with water, and drying the mask. CONSTITUTION:An emulsion containing diffused silver halide coated on a glass plate is exposed to a light pattern, then developed, fixed, and dried to provide an emulsion photomask for use in individual semiconductors and a small scale integrated circuit. Before drying the wetted mask, a surfactant is first coated on its surface by spraqing or dipping, and water drops are removed by low speed spin drying or the like. The surfactant reduces the surface tension of the liquid, permitting the drops to be converted into a flat film, and deformation of the pattern due to the surface tension and accordingly, deformation of the emulsion photomask due to water drops to be prevented. |
