PROCESSING JIG AND PRODUCTION METHOD OF SPUTTERING TARGET MATERIAL

摘要

PROBLEM TO BE SOLVED: To provide a processing jig capable of suppressing generation of a flaw or a crack on the outer peripheral surface of a cylindrical ceramic, and to provide a production method of a sputtering target material.SOLUTION: A processing jig in one embodiment includes a rotor. The rotor is rotated following rotation of a cylindrical ceramic. The length in the rotational axis direction of the rotor is 15 mm or more, and the material of at least a periphery of the rotor is a resin having Rockwell hardness of 80 or more and 125 or less, or a rubber having rubber hardness of 80 or more and 95 or less.SELECTED DRAWING: Figure 2