发明名称 ION MILLING DEVICE
摘要 PROBLEM TO BE SOLVED: To prevent reattachment of spatter particles to specimen, and obtain a clean processed surface.SOLUTION: A spatter particle adhesion member 109 for adhering spatter particles generated by ion beam irradiation, is arranged in the vicinity of the ion beam irradiation region of a specimen 101 mounted on a specimen support 107 so as not to prevent irradiation of an ion beam 103. The spatter particle adhesion member is controlled so as to be lower than the ion beam irradiation region.SELECTED DRAWING: Figure 1
申请公布号 JP2016173874(A) 申请公布日期 2016.09.29
申请号 JP20130132005 申请日期 2013.06.24
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 KITAYAMA SHINYA;TAKASU HISAYUKI;UENO ATSUSHI
分类号 H01J37/20;G01N1/28;H01J37/30 主分类号 H01J37/20
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