发明名称 CHARGED PARTICLE EXPOSURE EQUIPMENT
摘要 PURPOSE:To enable continuously correcting the variation of the dimensions of a pattern by providing a sub-deflection control equipment which controls a sub-deflection control equipment which controls a sub-deflection equipment to change the scanning speed of a charged particle beam by a main deflection equipment near the boundary of the non-exposure region and the exposure region of a pictured pattern. CONSTITUTION:The correction of pattern dimensions depends upon a sub- deflection control signal SC generated by a sub-deflection driving equipment 19. The sub-deflection control signal SC has a pulse which has the same timing of the two pulses contained in an edge detection signal ED. The polarity and the gain of the pulse, however, are varied according to the quantity of correction of the dimensions. For example, suppose if the sub-deflection control signal is SC1, i.e., the first pulse is negative and the second pulse is positive, the dimensions are corrected in the longitudinal like a pattern P1. Since the pulse gain can continuously be varied as analog quantity, the quantity of the correction can also be varied continuously.
申请公布号 JPS61256627(A) 申请公布日期 1986.11.14
申请号 JP19850097510 申请日期 1985.05.08
申请人 TOSHIBA CORP 发明人 MUNAKATA YASUO
分类号 G03F1/00;G03F1/76;G03F1/78;H01L21/027;H01L21/30 主分类号 G03F1/00
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