| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition that can give good CD (critical dimension) uniformity in the process of producing a resist pattern and can reduce the number of defects generating in the process of forming a resist pattern.SOLUTION: The resist composition includes: (A1) a resin having a structural unit expressed by formula (I); (A2) a resin which is insoluble or poorly soluble with an alkali aqueous solution and can dissolve in an alkali aqueous solution by the action of an acid; and (B) an acid generator having a structure to be cleaved by the action of an alkali developing solution. In formula (I), Rrepresents a hydrogen atom or a methyl group; Arepresents -(CH)-, -(CH)-O-(CH)-, or -(CH)-CO-O-(CH)-, where m1 to m5 each independently represent an integer of 1 to 6; and Rrepresents a hydrocarbon group having 1 to 10 carbon atoms and having a fluorine atom. |
