| 摘要 |
PURPOSE:To enhance the reliability of a detecting element by laminating thin titanium film layers on front and rear faces of a thin platinum film layer, thereby forming the electrode to be joined to the sensitive film of the detecting element. CONSTITUTION:An insulating layer 5 is formed on the surface of a substrate 4 and the thin titanium film 6 is laminated by a vacuum deposition method thereon; further, the thin platinum film 7 is formed by a sputtering method thereon The thin titanium film 8 is thereafter formed by the vacuum deposition method on the film 7. The three layers; titanium/platinum/titanium are etched to a comb-shaped pattern by sputter etching. The sensitive film 9 consisting of, for example, germanium is then formed by the vacuum deposition method on such electrode. Such substrate is diced to a chip and is formed with leads to form the detecting element. This detecting element has the high adhesiveness between the substrate, the electrode layer and the sensitive film; in addition, the film obviates alloying, etc., and is, therefore, highly reliable.
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