| 摘要 |
PURPOSE:To form transparent electrodes only on the color filters with good accuracy by forming a transparent conductive film on the color filters, laminating a positive resist having a high sensitivity with light of a specific wavelength or below thereof and irradiating the positive resist with light from the rear of the color filters, thereby exposing the positive resist. CONSTITUTION:The transparent electrodes 22 consisting of ITO and the color filters 23 are formed on a glass substrate 21. Further, the transparent conductive film 24 consisting of the ITO is formed by sputtering, vapor deposition, etc., thereon. The positive resist 25 is applied over the entire surface. This positive resist has the high sensitivity with mainly the light of <=400nm and the absorbance thereof per 1mum at 365nm is 0.7. The positive resist is exposed from the rear surface of the substrate by the light 26 using a high-pressure mercury lamp as a light source and the color filter as a photomask. The positive resist is then developed to expose the ITO in the spacing parts between the color filters. the ITO in the spacing parts between the color filters is etched to strip the remaining resist and driving electrodes 27 are formed only on the electrodes. |
