| 摘要 |
An electron beam direct drawing device for use in manufaturing a printed circuit board having a photoresist thereon according to a drawing pattern information obtained by a computer aided printed circuit board pattern design, comprises means for dividing the drawing pattern information over a whole area of the printed circuit board into a plurality of fields each capable of being scanned by electron beam and for re-editing drawing patterns of the rspective fields, means for storing the divided and then re-edited drawing pattern information, means for generating a first control signal for reading out the stored drawing pattern information sequentially and performing a main deflection of electron beam by means of a main deflector and means for generating a second control signal for deriving, from the stored drawing pattern information, information assigning an orientation of a pattern to be drawn and a scan width of a sub-deflection and for performing a predetermined sub-deflection scanning by means of a sub-deflector, whereby electron beam scans the printed circuit board under a control of a combination of the main deflection and the sub-deflection. A clock generator capable of producing a plurality of clock signals each corresponding to a specific line width of the pattern is provided to expose the line with electron beam of optimum dose. |
