MICROWAVE PLASMA ASSISTED GAS JET DEPOSITION OF THIN FILM MATERIALS

摘要

A novel method and apparatus of fabricating thin film materials utilizing high speed gas dynamics relies on supersonic free jets of carrier gas to transport depositing vapor species generated in a microwave discharge to the surface of a prepared substrate where the vapor deposits to form a thin film. The present invention generates high rates of deposition and thin films of unforeseen high quality at low temperatures.