| 摘要 |
PURPOSE:To obtain the organosilicon polymer suitable for use in a positive type resist sufficient in oxygen plasma resistance and superior in sensitivity and resolution by using the organosilicon polymer specified in weight average molecular weight. CONSTITUTION:This organosilicon polymer has a weight average molecular weight of 10<3> - 5X10<6> and represented by the formula; [SinC6-aO3a/2]m [R<1>3SiO1/2]n in which a is 2, 3, or 4, preferably, 2 or 3; m/n is 10/90 - 90/10, preferably, 10/20 - 20/10; R<1> is, independently, -COOR, (R is 1 - 5 C alkyl), 1 - 3 C alkyl, or phenyl optionally substituted by 1 - 3 C alkyl; and at least >=20% of R<1> is -COOR, thus permitting the obtained organosilicon polymer to be suitable for use in the positive type resist, and the obtained resist to be sufficient in the oxygen plasma resistance when it is used for the upper resist of the 2-layer structure, and to be superior in sensitivity and resolution. |
