| 摘要 |
There is described herein a method of forming amorphous polymeric halosilane films by decomposition on a substrate of bromo-, chloro-, fluoro-, di- or polysilanes at a temperature of between about 250 DEG C and 550 DEG C. As an example, hexafluorodisilane was decomposed at 350 DEG C for 45 minutes and formed a gold lightly reflective film on a glass substrate. The films so formed may have application as solar cells, thin film transistors, optical data storage media and scratch resistant coatings. |
