发明名称 |
PRODUCTION METHOD OF ALUMINUM OXIDE SINGLE CRYSTAL WAFER |
摘要 |
PROBLEM TO BE SOLVED: To provide a production method of an aluminum oxide single crystal wafer capable of controlling a warp quantity of warp which is not concentric circular in the wafer.SOLUTION: A production method of an aluminum oxide single crystal wafer has a lapping process for lapping main surfaces on both sides of the aluminum oxide single crystal wafer, and a partial blast treatment process for applying a blast treatment to a partial region on the main surface on one side of the aluminum oxide single crystal wafer to which the lapping process is executed.SELECTED DRAWING: Figure 3 |
申请公布号 |
JP2016222476(A) |
申请公布日期 |
2016.12.28 |
申请号 |
JP20150108465 |
申请日期 |
2015.05.28 |
申请人 |
SUMITOMO METAL MINING CO LTD |
发明人 |
MATSUMOTO HIROSHI;ABE HIROSHI;YAMAGATA TOSHIYUKI |
分类号 |
C30B29/20;C30B33/00;C30B33/02 |
主分类号 |
C30B29/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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