发明名称 PRODUCTION METHOD OF ALUMINUM OXIDE SINGLE CRYSTAL WAFER
摘要 PROBLEM TO BE SOLVED: To provide a production method of an aluminum oxide single crystal wafer capable of controlling a warp quantity of warp which is not concentric circular in the wafer.SOLUTION: A production method of an aluminum oxide single crystal wafer has a lapping process for lapping main surfaces on both sides of the aluminum oxide single crystal wafer, and a partial blast treatment process for applying a blast treatment to a partial region on the main surface on one side of the aluminum oxide single crystal wafer to which the lapping process is executed.SELECTED DRAWING: Figure 3
申请公布号 JP2016222476(A) 申请公布日期 2016.12.28
申请号 JP20150108465 申请日期 2015.05.28
申请人 SUMITOMO METAL MINING CO LTD 发明人 MATSUMOTO HIROSHI;ABE HIROSHI;YAMAGATA TOSHIYUKI
分类号 C30B29/20;C30B33/00;C30B33/02 主分类号 C30B29/20
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