IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a technique which is advantageous for reducing transfer failure of a pattern.SOLUTION: In an imprint apparatus, a pattern is formed on a substrate by using a mold on an imprint material. The imprint apparatus comprises a drive unit for adjusting a relative position and a relative inclination between a mold and a substrate, an imaging unit that images interference fringes formed by illuminating the substrate via the mold a plurality of times in a process in which a contact area between the imprint material and the mold is enlarged as a distance between the mold and the substrate is reduced by the drive unit, and a control for controlling the drive unit so that a relative inclination between the mold and the substrate is corrected a plurality of times in the process on the basis of images captured a plurality of times by the imaging unit.SELECTED DRAWING: Figure 1