| 发明名称 |
VAPOR DEPOSITION OF LiF THIN FILMS |
| 摘要 |
A vapor deposition process for forming a thin film on a substrate in a reaction chamber where the process includes contacting the substrate with a fluoride precursor. The process results in the formation of a lithium fluoride thin film. |
| 申请公布号 |
US2016369397(A1) |
申请公布日期 |
2016.12.22 |
| 申请号 |
US201615186249 |
申请日期 |
2016.06.17 |
| 申请人 |
ASM IP Holding B.V. |
发明人 |
Mäntymäki Miia;Hämäläinen Jani;Ritala Mikko;Leskelä Markku |
| 分类号 |
C23C16/455;C23C16/08 |
主分类号 |
C23C16/455 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
Almere NL |
