发明名称 PROCESS FOR HEAT TREATING A SAPPHIRE COMPONENT
摘要 A system and processes for heat treating sapphire components to improve strength while maintaining the optical finish and/or transparency of the component. The processes may include an annealing process that uses an inert gas to reduce potential contaminants and the presence of reactive gasses. The process may also include a multi-stage heating process that may reduce thermally induced stress within the sapphire component which may produce slip lines or other optical defects. The process may also include a series of wet ultrasonic cleaning operations that reduce potential contaminants which may cause optical defects in an annealed sapphire component. An example system, fixtures, and shields are also described, which may improve the quality of the heat-treating process.
申请公布号 US2016370116(A1) 申请公布日期 2016.12.22
申请号 US201514745055 申请日期 2015.06.19
申请人 APPLE INC. 发明人 Rogers Matthew S.;Jones Christopher D.;Memering Dale N.;Hoffman Alexander M.;Chen Ping Chung;Huang Chien-Wei
分类号 F27D7/06;B08B3/12;F27D19/00 主分类号 F27D7/06
代理机构 代理人
主权项 1. A method of heat treating a sapphire component, the method comprising: positioning the sapphire component in an internal volume of a furnace; removing gas from the internal volume of the furnace by applying a vacuum; introducing an inert gas to the internal volume of the furnace; heating the internal volume of the furnace to a first threshold temperature; maintaining the first threshold temperature for a first duration; heating the internal volume of the furnace to a second threshold temperature; and maintaining the second threshold temperature for a second duration.
地址 Cupertino CA US