发明名称 FILM FORMATION MASK, AND METHOD FOR PRODUCING FILM FORMATION MASK
摘要 The present invention is provided with: a resin layer 2 having, provided therein, a plurality of first slits 6 corresponding to a pattern to be formed on a film formation substrate to have a film formed thereon; and a metal layer 3 which is stacked on the resin layer 2, has second slits 7 provided in positions corresponding to the first slits 6, and has, provided in a plurality of places, with a prescribed interval therebetween, reinforcement parts 4 which intersect and are connected to the second slits 7. Laser processing is performed on the stacked resin layer 2 to remove the resin of the stacked resin layer 2 from reinforcement-part 4 areas of the metal layer 3. The resin layer 2 is provided with a regular opening pattern, and an irregular shielding pattern which divides the opening pattern. As a result, a film formation mask can be provided with which processing in areas directly below the reinforcement parts is facilitated, and with which a regular pattern and an irregular pattern can be easily formed on the film formation substrate.
申请公布号 WO2016204019(A1) 申请公布日期 2016.12.22
申请号 WO2016JP66874 申请日期 2016.06.07
申请人 V TECHNOLOGY CO., LTD. 发明人 KAJIYAMA, Koichi;MIZUMURA, Michinobu;KOBAYASHI, Ikunori;FUJIMORI, Yuya
分类号 C23C14/04 主分类号 C23C14/04
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