发明名称 Plasma Source Device and Methods
摘要 This disclosure describes a remote plasma source, a gas input manifold, and related methods of making and using. In some examples, a remote plasma source is provided with a plasma chamber, a gas input manifold, and an output region. The remote plasma source also has means for introducing a gas into the plasma chamber, the means for introducing configured to impart a radial velocity and a longitudinal velocity on the gas, relative to a longitudinal axis through the remote plasma source.
申请公布号 US2016268104(A1) 申请公布日期 2016.09.15
申请号 US201615067060 申请日期 2016.03.10
申请人 Advanced Energy Industries, Inc. 发明人 Polak Scott;Carter Daniel;Peterson Karen;Grilly Randy;Thornton Mike;Hoffman Daniel J.
分类号 H01J37/32 主分类号 H01J37/32
代理机构 代理人
主权项 1. A remote plasma source configured to transform a gas passing therethrough into a plasma, the remote plasma source comprising: an enclosure defining a plasma chamber, the enclosure configured to isolate the gas from external atmosphere, as the gas is transformed into the plasma and comprising an output passage configured to deliver constituents of the plasma from the plasma chamber; and a gas input manifold coupled to the enclosure and configured to introduce the gas into the plasma chamber; wherein a longitudinal axis extends through the gas input manifold and through the plasma chamber; the gas input manifold comprises a gas entry port in a manifold body, a gas chamber, and a plurality of channels, the gas entry port configured to couple to a gas supply and to introduce the gas to the gas chamber, the plurality of channels configured to direct the gas from the gas chamber downstream to the plasma chamber and to impart a radial velocity and a longitudinal velocity on the gas as the gas passes through the plurality of channels.
地址 Fort Collins CO US