| 摘要 |
PROBLEM TO BE SOLVED: To provide: a mask that is hardly cut by ion beams and is easily handled, in order to address such problems that, for example, when a mask is formed of a metal material such as titanium and molybdenum, the mask is easily cut by ion beams, so that the life tends to be shortened, and for example, when a mask is formed of carbon graphite, the mask is hardly cut by ion beams, but is easily cracked and difficult to be handled due to properties of materials; a method for using a mask; and an ion milling device including a mask.SOLUTION: A mask 8 according to the present invention is formed of an alloy comprising carbon and the remainder of tungsten and inevitable impurities.SELECTED DRAWING: Figure 1 |
