发明名称 |
IMAGING PROCESS ON SUBSTRATES WITH AQUEOUS ALKALINE SOLUBLE UV BLOCKING COMPOSITIONS AND AQUEOUS SOLUBLE UV TRANSPARENT FILMS |
摘要 |
Substrates, such as printed circuit boards, are coated with an aqueous alkaline developable UV photosensitive material followed by applying an aqueous soluble UV transparent film to coat the UV photosensitive material. An aqueous alkaline soluble UV blocking composition is selectively applied to the surface of the UV blocking film to function as a mask. UV light is applied to portions of the UV photosensitive material not covered by the mask. The UV blocking composition, UV transparent film and selective sections of the UV photosensitive material are simultaneously removed with an aqueous alkaline developer solution to form an image on the substrate. |
申请公布号 |
EP2950144(B1) |
申请公布日期 |
2016.12.14 |
申请号 |
EP20150169451 |
申请日期 |
2015.05.27 |
申请人 |
Rohm and Haas Electronic Materials LLC |
发明人 |
BALANTRAPU, Krishna;AMOS, Brian D.;McCAMMON, Stephen |
分类号 |
H05K3/00;G03F7/035;G03F7/038;G03F7/09;G03F7/11;G03F7/20;H05K3/28;H05K3/34 |
主分类号 |
H05K3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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