发明名称 新規な絶縁膜及びその利用、並びに絶縁膜の生産方法
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which is excellent in tackiness after application and drying, can be microfabricated because of its photosensitivity, can obtain a cured film with excellent flexibility, fire retardancy, and electrical insulation reliability, and has low post-curing warpage of a substrate, and a resin film, an insulator film and a print circuit board with the insulator film.SOLUTION: A photosensitive resin composition at least contains (A) a binder polymer, (B) crosslinked polymer particles having an urethane bond and a radical polymerizable group within a molecule, (C) a compound having a radical polymerizable group within a molecule, and (D) a photopolymerization initiator.
申请公布号 JP6043066(B2) 申请公布日期 2016.12.14
申请号 JP20120013339 申请日期 2012.01.25
申请人 株式会社カネカ 发明人 関藤 由英
分类号 G03F7/027;C08F290/06;C09K21/12;G03F7/004;H05K3/28 主分类号 G03F7/027
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