发明名称 SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device manufacturing method capable of manufacturing an IC at low cost and with high reliability by using a plurality of chips using substrates made of different materials.SOLUTION: A semiconductor device manufacturing method comprises: a process of fixing by resin, a first semiconductor chip having an electrode formed on a surface side and a through electrode penetrating from the surface side to a rear face side, and a second semiconductor chip having an electrode formed on a surface side and a through electrode penetrating from the surface side to a rear face side on the rear face side of the first semiconductor chip and on the rear face side of the second semiconductor chip; a process of removing the resin by etching to expose the rear face side of the first semiconductor chip and the rear face side of the second semiconductor chip; and a process of forming a common electrode on the rear face side of the first semiconductor chip and on the rear face side of the second semiconductor chip.SELECTED DRAWING: Figure 14
申请公布号 JP2016207802(A) 申请公布日期 2016.12.08
申请号 JP20150086732 申请日期 2015.04.21
申请人 FUJITSU LTD 发明人 OKAMOTO NAOYA
分类号 H01L23/12;H01L25/04;H01L25/18 主分类号 H01L23/12
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