发明名称 電子ビーム照射装置および電子ビーム照射方法
摘要 PROBLEM TO BE SOLVED: To stably practice irradiation of an electron beam suitable for improving metal strip characteristics without spoiling a production efficiency of a metal strip product.SOLUTION: A plurality of electron guns to irradiate an electron beam on the surface of a metal strip conveyed in order are arranged adjacently to each other with a space of a half or less of a scanning width of the electron beam and with the equal space in the width direction of the metal strip. A plurality of the electron guns share electron beam scanning to the surface of the metal strip in the width direction. When an electron gun among a plurality of the electron guns is unable to irradiate the electron beam, the scanning width of a normal electron gun adjacent to the unable electron gun is extended to the entire area of the electron beam scanning of the unable electron gun. A plurality of the electron guns except the unable gun thus share electron beam scanning to the surface of the metal strip in the width direction.
申请公布号 JP6040920(B2) 申请公布日期 2016.12.07
申请号 JP20130242958 申请日期 2013.11.25
申请人 JFEスチール株式会社 发明人 古賀 泰成;赤木 功;▲高▼城 重宏;松田 健嗣;齋木 順一
分类号 C21D8/12;C21D1/38 主分类号 C21D8/12
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