METHOD FOR INJECTING GAS IN SEMICONDUCTOR MANUFACTURING EQUIPMENT

摘要

PURPOSE: A method for injecting gas in a semiconductor manufacturing equipment is provided to mix uniformly gas by pre-mixing two kinds of gas within a mixing chamber and injecting the mixed gas to an inner portion of a semiconductor manufacturing equipment. CONSTITUTION: A method for injecting gas in a semiconductor manufacturing equipment comprises the following steps. A mixing chamber(390) is prepared to mix two kinds of gas and inject mixed gas. The mixing chamber comprises two inflow tubes(391) and an exhausting tube(392). The inflow tubes receives two kind of gas. The two kinds of gas are mixed within the mixing chamber. The mixed gas is injected through a gas injection hole(61) connected to the exhausting tube to an inner tube(30).