Damping arrangement for dissipating oscillating energy of an element in a system, more particularly in a microlithographic projection exposure apparatus

摘要

The invention relates to a damping arrangement for dissipating oscillation energy of an element in a system, more particularly in a microlithographic projection exposure apparatus, comprising an absorber mass, which is mounted via a stable mounting with respect to the element, wherein the absorber mass is arranged in a cavity present within the element and is at least partly surrounded by a fluid situated in the cavity, wherein a mass-spring system is formed by the absorber mass, the system damping a translational movement component of an oscillation of the element that exists at the linking point of the absorber mass, and wherein the stable mounting is formed by a rheological fluid that is electrically controllable or controllable via electric or magnetic fields.

主权项

1. An arrangement, comprising:
a mirror having a cavity; a rheological fluid in the cavity of the mirror; and an absorber mass in the cavity of the mirror, wherein:
the absorber mass is at least partly surrounded by the rheological fluid so that the absorber mass and the rheological fluid define a mass-spring system that is configured to dampen a translational movement component of an oscillation of the mirror that exists at a linking point of the absorber mass; andthe arrangement is configured to be used in a microlithographic projection exposure apparatus.