AUTOMATIC PRODUCTION OF PHASE SHIFTER AND DEVICE THEREFOR AS WELL AS SEMICONDUCTOR DEVICE PRODUCED BY MASK DESIGNED BY USING THE SAME

摘要

PURPOSE: To make it possible to automatically produce auxiliary patterns and phase shifter patterns in mask pattern design for a phase shift exposure method known as an outrigger type for actual patterns which are desired design patterns including recessed regions. CONSTITUTION: The auxiliary patterns and the phase shifter patterns are automatically produced in accordance with the actual patterns by using the line width Bc regulating the fine line part patterns of the actual patterns requiring the auxiliary patterns on the periphery, the distances L1 between the desired actual patterns and the auxiliary patterns, the line widths Bs of the auxiliary patterns, the min. distance L2 between the auxiliary patterns and the alignment allowance La of the auxiliary patterns and the phase shifter patterns as parameters by a stage 1 to a stage 6 in mask pattern design for the phase shift exposure method consisting of actual patterns, the auxiliary patterns and the phase shifter patterns.