发明名称 |
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME |
摘要 |
In a semiconductor device and a method of manufacturing the same a fuse structure may be formed during formation of first to third contact plugs connected to a transistor. The fuse structure may include first and second fuse contact plugs having the same height as the first and second contact plugs, and a connection pattern having the same height as the third contact plug. The connection pattern may be connected between the first and second fuse contact plugs. |
申请公布号 |
US2017069570(A1) |
申请公布日期 |
2017.03.09 |
申请号 |
US201615229518 |
申请日期 |
2016.08.05 |
申请人 |
Samsung Electronics Co., Ltd. |
发明人 |
Yoon Jihoon;Min Shincheol;Choi Hyun-Min |
分类号 |
H01L23/525;H01L21/66;H01L27/112 |
主分类号 |
H01L23/525 |
代理机构 |
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代理人 |
|
主权项 |
1. A semiconductor device comprising:
a substrate including a first region and a second region; a transistor comprising a gate electrode and first and second dopant regions that are disposed on the first region of the substrate; first, second, and third contact plugs electrically connected to the first dopant region, the second dopant region, and the gate electrode, respectively; and a fuse structure disposed on the second region of the substrate, the fuse structure comprising: first and second fuse contact plugs having the same height as the first and second contact plugs; and a connection pattern having the same height as the third contact plug, wherein the connection pattern is connected between the first and second fuse contact plugs. |
地址 |
Suwon-si KR |