发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 In a semiconductor device and a method of manufacturing the same a fuse structure may be formed during formation of first to third contact plugs connected to a transistor. The fuse structure may include first and second fuse contact plugs having the same height as the first and second contact plugs, and a connection pattern having the same height as the third contact plug. The connection pattern may be connected between the first and second fuse contact plugs.
申请公布号 US2017069570(A1) 申请公布日期 2017.03.09
申请号 US201615229518 申请日期 2016.08.05
申请人 Samsung Electronics Co., Ltd. 发明人 Yoon Jihoon;Min Shincheol;Choi Hyun-Min
分类号 H01L23/525;H01L21/66;H01L27/112 主分类号 H01L23/525
代理机构 代理人
主权项 1. A semiconductor device comprising: a substrate including a first region and a second region; a transistor comprising a gate electrode and first and second dopant regions that are disposed on the first region of the substrate; first, second, and third contact plugs electrically connected to the first dopant region, the second dopant region, and the gate electrode, respectively; and a fuse structure disposed on the second region of the substrate, the fuse structure comprising: first and second fuse contact plugs having the same height as the first and second contact plugs; and a connection pattern having the same height as the third contact plug, wherein the connection pattern is connected between the first and second fuse contact plugs.
地址 Suwon-si KR